
Name: Plasma cleaning machine
Manufacturer: Gatan, Inc., U.S.
Purchasing date: 10, 2012
Main technical indicators:
1. Three gas input channel (O2, H2, Ar)
2. Oxygen and hydrogen flow controller
3. Independent power supply
4. Reserved interface for TEM sample holders
5. Large sample chamber with diameter> 8cm, height> 5cm
Common accessories: special interface for TEM sample holder, nitrogen, oxygen, hydrogen
Main application area: electronic microscopy sample cleaning
Main functions:
- Rinsing standard TEM sample holder: applicable for side-plug TEM sample holder to remove hydrocarbon contamination for TEM sample carrier and sample.
- STEM analysis: It can be used to remove surface contamination of samples and sample holder, prevent carbon deposition from reducing the image resolution, and misjudgment on micro-analysis of the sample, improve its imaging capability at low-voltage and its accuracy on trace chemical analysis. It provides more time for reading and data-getting times for EDS and SEM. It is applicable to field emission scanning electron microscopy, field emission TEM, SEM and EDS analysis.
- The multifunctional cavity can take two TEM sample holders and load a variety of scanning samples.
- It has dedicated chemical gas H2/O2, which can reduce the sputtering damage of samples in the process of chemical cleaning and can also be used to clean porous carbon film.
Person in charge of the equipment: Zhang Weina
Ways of contact:
Tel: 13604028597 024-83686411
E-mail:
Location: Room 101, RAL Building
Operation Rules
1. Preparation before operation: ensure Ar and O2 gas cylinders are not empty;
2. Power on the machine and start it. Check whether the gas connection is normal in the front-end displayer of the equipment;
3. Put the TEM sample into the sample electron microscope sample holder;
4. Put the sample holder into FEI connector, and insert it into lasma cleaning machine. Make sure they are tightly connected.
5. Select plasma gas components (TEM, STEM and other models);
6. Click the “Vacuum” button; observe the sample chamber vacuum achieve its rated value;
7. Click the “Start” button to start cleaning;
8. After cleaning, click “Deflation” button. After deflation, take out the sample and reconnect the sealed port to the interface. After experiment, stop the host and cylinders.
Attention: When the equipment is not in use, try to keep Ar and O2 plasma cleaning machine connected to avoid gas channel from being contaminated.

